
3-Trifluoromethylphenyl hydrazine | CAS:368-78-5
3-Trifluoromethylphenyl hydrazine
- 名称:3-三氟甲基苯基肼 | 3-Trifluoromethylphenyl hydrazine
- CAS号:368-78-5
- 别名:NSC 157345; m-(Trifluoromethyl)phenylhydrazine; alpha,alpha,alpha-Trifluoro-m-tolylhydrazine
- 分子式:C7H7F3N2
- 分子量:176.14
- EINESC号:206-713-5
产品描述
物理化学性质
沸点 | 138-140 ºC (14 Torr)** |
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闪点 | 107.2±0.0 ºC, 计算值* |
折射率 | 1.5052 (589.3 nm 24 ºC)*** |
安全数据
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SDS
来源 | SDS样本 |
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没有数据 | 没有数据 |
产品合成路线
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同行评议文献
?Writing-Reading-Erasing? on tungsten oxide films using the scanning electrochemical microscopeTuryan I, et al. Advanced Materials, 12(5), 330-333 (2000)
Formation of Ruthenium Cluster on Nanocrystalline Tungsten Trioxide.Fujioka Y, et al. The Journal of Physical Chemistry C, 117(15), 7506- 7510 (2013)
Electrochromic tungsten oxide films: review of progress 1993-1998Granqvist CG Solar Energy Materials and Solar Cells, 60(3), 201-262 (2000)
A thin-film sensing element for ozone, humidity and temperatureQu W and Wlodarski W Sensors and Actuators B, Chemical, 64(1-3), 42-48 (2000)
Thermal effects associated with the Raman spectroscopy of WO3 gas-sensor materials.Garcia-Sanchez RF, et al. The Journal of Physical Chemistry A, 117(50), 13825-13831 (2013)
Chemical vapor synthesis (CVS) of tungsten nanopowder in a thermal plasma reactorRyu T, et al. International Journal of Refractory Metals & Hard Materials, 27(1), 149-154 (2009)
Structure and electronic properties of solid acids based on tungsten oxide nanostructuresBarton DG, et al. The Journal of Physical Chemistry B, 103(4), 630-640 (1999)
Structural Properties of Pure and Nickel-Modified Nanocrystalline Tungsten Trioxide.Fujioka Y, et al. The Journal of Physical Chemistry C, 116(32), 17029-17039 (2012)
备注
Products protected by valid patents are not offered for sale in countries where the sale of such products constitutes a patent infringement and its liability is at buyer's risk.
Products currently covered by valid US Patents are offered for R&D use in accordance with 35 USC 271 +A13(1).
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